Star Wars Roleplay: Chaos

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Molecular Manipulation Implant B

  • Intent: To create a generic blaster rifle.
  • Image Source: N/A (No Image)
  • Canon Link: N/A
  • Permissions: N/A
  • Primary Source: E-11 Blaster Rifle
PRODUCTION INFORMATION
TECHNICAL SPECIFICATIONS
  • Classification: Combat Implant allowing for ranged attack
  • Size: Very Small
  • Weight: Very Light
  • Ammunition Type: Psychic Energy
  • Ammunition Capacity: High | Organic Battery that starts at one hundred percent charge, gradually decreasing to zero over ten seconds
  • Effective Range: Personal
  • Rate of Fire: High
  • Damage Output: High
  • Recoil: Very Low
SPECIAL FEATURES
  • Implant causes Cryonic Radiation tuned to be harmless to the user to emit from the palms in a focused beam that rapidly freezes targets
  • Implant charged by the mental energy of the brain, slowly recharging from minute amounts of it
  • Capable of self repair
  • Renders user resistant to Cryonics and cold weather
STRENGTHS
WEAKNESSES



DESCRIPTION
 

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